* Not really but it is in pristine condition with less than 200 hours operation.

Currently this 4 year old SS30T demo sputtering system is operational in T-M Vacuum’s Applications Lab and loaded with features for the right lab. We are bringing in a new system and need the space.

Sputtering System Configuration

30” Diameter Stainless Steel Chamber. Front door for routine chamber access. Vertical lift & swing top plate for internal maintenance High Vacuum Load Lock with dedicated 400l/s Turbo-molecular Pump Two (2) 200mm stainless steel pallets provided 250MM load lock isolation valve Dedicated Alcatel 11 cfm mechanical pump on Load Lock Turbo Alcatel ATP 900 l/s Turbo molecular pump on main Chamber Servo controlled throttling gate valve for upstream/downstream gas control 16 CFM dry pump as backing pump for main chamber TMP Alcatel 42 cfm roughing pump shared by LL & main chamber Ultimate chamber vacuum <8X10 -8 Torr Four Angstrom Sciences Onyx 3, 3” cathodes w/variable XYZ & 2 axis tilt sput down. Port provided for GLAD.

Four (4) Dedicated 5000W AE Pinnacle Plus ™ Pulsed DC power supplies for reactive or pure material deposition Four (4) Mass flow controllers (3 X 200sccm, 1 X10sccm) Gas Mixing manifold and five (5) user selectable gas injection rings - 1 for main chamber 1 for each of 4 cathodes MKS Capacitance Manometer Inficon XTM 2 Deposition Monitor with single crystal head Deposition Uniformity +/- 5% over 6” diameter area 8” substrate platen with dedicated shutter Dedicated Seren 300 watt power supply for etch and bias Substrate backside heat to 900C (45 min. typical) Independent chamber heater to assist in attaining UHV conditions after cleaning Spectra 0-100AMU RGA dedicated to process chamber Full computer control with manual operation capability 1 year factory warranty Installation by factory trained engineer

Attractively offered at $ 250,000.00 FOB Cinnaminson

For more information regarding this sputtering system, contact T-M Vacuum email info@tmvacuum.com or
call 856-829-2000