The Smart Jar™ System for Evaporation
The Super Series Smart Box™
The Smart Jar™ can be used for either dielectric or metals deposition.
- Full opening front door for ease of loading
- Multiple sources, either electron beam guns and/or thermal sources for varied material requirements
- Ion-assisted deposition (IAD) for dense moisture stable dielectric films
- In-situ optical monitoring for accurate layer termination
- Dual rotation tilt or fixed planetary for precision coatings
- Single rotation domes for high system productivity
- Addition of sputter sources for unique deposition requirements
- Substrate heat for cleaner substrates and denser more homogenous films
- Gas introduction and control for reactive film deposition
- Electro-polished chamber, with in-situ heater and high speed pumping for lower cleaner partial pressure
- Source distance dynamically variable and positionable
- Production proven software tailored to meet your needs
The Super Series Smart Box™ for Evaporation
With over 40 years of experience, TM Vacuum Products offers innovative solutions for any thin film deposition requirement. The Super Series Smart Box™ is designed to meet critical production requirements. With chamber sizes from as small as 32″ to as large as 80″ available, almost any capacity and process requirement can be economically met. With the extensive combinations of sources and fixtures available, a Smart Box™ can be designed to meet all present needs and still have the flexibility to meet unanticipated future requirements. The Smart Box™ is designed to meet and fulfill your production needs both now and in the future.
Features and Options
- Chamber size: Diameters from 18-48″, electro-polished stainless steel
- Chamber cooling: Double-wall full water jacket standard
- Pumping: Cryopump standard, turbomolecular or diffusion pump and cryo trap available
- Meissner: Port provided, internal coil and closed cycle cryogenic refrigerator available
- Base vacuum: Below 3 X10-7 Torr standard
- Fixturing: Dual rotation fixed, or tilt adjustable, planetary or single rotation dome sized for specific substrates
- Sources: Multiple electron beam guns and thermal sources, IAD and sputtering cathodes can be accommodated
- Metrology: In-situ optical monitoring either via witness piece or substrate available. Single or multiple quartz crystal monitors as required for rate control and layer termination
- Uniformity: Deposition uniformity of better than +/- 1% attainable
- Capacity: Capacities controlled by chamber size and required fixturing configuration
- Chamber heat: Chamber bake optional
- Substrate heat: Temperatures to 400°C available
- Controls: Full computer control with data logging for repeatable processes. Redundant manual control standard.
